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Resources

Bar Review Classes


In recent years, the pass rate of the Patent Bar ranged from 29% to 60%. Patent Bar review classes are offered by the following organizations:

Patent Resources Group

2318 Mill Road, 12th Floor
Alexandria, Virginia 22314
(703) 682-4860 Fax (703) 892-4510


Practicing Law Institute

New York Offices & Conference Center
1177 Avenue of the Americas, 2nd Floor
New York, NY 10036
(212) 824-5700(800) 260-4754

San Francisco Offices & Conference Center
655 Market Street, Suite 100
San Francisco, CA 94105-4202
(415) 498-2800(800) 260-4754

U.S. Patent & Trademark Office


US Patent & Trademark Office

www.uspto.gov
Toll-Free : 800-786-9199
Local : 571-272-1000
TTY : 800-877-8339

To register to take the Patent Bar

Contact the Office of Enrollment and Discipline
Phone : 571-272-4097
Fax : 571-273-0074
Email : oed@uspto.gov
Mailing Address :
Mail Stop OED
U.S. Patent and Trademark Office
P.O. Box 1450
Alexandria, VA 22313-1450

 

Sample Resume



Your Name

Street Address
City, State, Zip
Home Phone
Work Phone (optional)
Email Address

Education:

1986Degree, School, City, State (JD)
1980Degree, School, City, State (Advanced Degree)
1978Degree, School, City, State (Undergraduate)

Bar Admissions:

1986US Patent & Trademark Office
1980State of New York
1978State of Massachusetts

Experience:

Ten plus years of experience which has included, but not been
limited to, preparing and prosecuting patent applications in a wide
variety of electronic, electrical and mechanical arts, infringement
and validity studies, licensing, assisting with litigation, trademark
and copyright practice and management responsibilities.

Representative Arts:

Data Processing, Electronic displays, Circuits, semiconductors,
superconductors, Computer hardware/software.

Employers:

1990 to PresentCompany/Law firm, City, State, Job Title
1988-1990Company/Law firm, City, State, Job Title
1986-1988Company/Law firm, City, State, Job Title

Memberships:

American Bar Association
American Intellectual Property Law Association

References:

Available upon request.

 
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